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+421 43 4292 362
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+421 43 4292 362
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OCTOMAG series

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  • staton.sk - PVD coating machines, equipment & coatings staton.sk - PVD coating machines, equipment & coatings

    M250-G2

    Small batch and R&D

    The M250-G2 is an excellent choice for PVD coating, especially when dealing with small batches or conducting R&D. Its rapid turnaround times enable the processing of several batches within a single day, ensuring high flexibility across different processes, coatings, and products. When integrated with larger machinery, this efficient system helps optimize production flow and effectively manages capacity gaps. The M250-G2 is particularly well-suited for scaling up new products.

     

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  • staton.sk - PVD coating machines, equipment & coatings staton.sk - PVD coating machines, equipment & coatings

    M500-G2

    Flexible medium-scale batch

    The M500-G2 excels as a flexible PVD coating solution tailored for medium-scale production, offering versatility across various types of tools and components. With its capability to handle varying batch sizes seamlessly, this system ensures efficient and reliable performance across a spectrum of production needs. Versatile and robust, the M500-G2 is poised to meet the diverse demands of modern manufacturing with precision and ease.

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  • staton.sk - PVD coating machines, equipment & coatings staton.sk - PVD coating machines, equipment & coatings

    M700-G2

    Flexible large-scale batch

    The M700-G2 represents a flexible PVD coating solution optimized for efficient handling of large-scale batches. Engineered to accommodate diverse tools and components, it excels in seamlessly managing varying batch sizes to deliver consistent, reliable performance across a broad array of production demands. Versatile and durable, the M700-G2 is designed to meet the demanding standards of contemporary manufacturing, ensuring precise and straightforward operation in every scenario.

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  • M1000_HQ-2

    M1000-G2

    Mass production or large components

    The M1000-G2 is the ultimate solution for coating large components and mass production of cutting tools. Designed for high capacity and maximum productivity, it accommodates even the largest forming tools, extra-large cutting tools, and lengthy components. With its capabilities tailored for substantial volumes, the M1000-G2 is your ideal choice for meeting demanding production requirements efficiently.

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Precision with Magnetron sputtering technology

Magnetron sputtering is a popular technique for thin film deposition, known for its efficiency and versatility. It uses the physical vapor deposition (PVD) process, in which a target material, typically a metal or ceramic, is bombarded with high-energy ions to from a plasma. This bombardment causes atoms from the target to be ejected and then deposited on a substrate, resulting in a thin film. In contrast to cathodic ARC evaporation, droplets do not form during sputtering, surface of the coating is smooth but deposition rate is lower.

Achieve superior coatings with Multipole Variable Magnetic Field

Numerous elements of the magnetic field design are adjusted to meet process requirements. The magnetic field’s strength can be a significant factor. Easy adjustment of the magnetic field from balanced to highly unbalanced provides benefits for hard, decorative or functional coatings.

Multipole magnetic array
Multipole magnetic array designs to flatten the field over the target surface brings very high target utilization to increase machine up-time and reduce material costs. Other benefit is much fewer defects when HiPIMS (High Power Impulse Magnetron Sputtering) is used.
Multipole magnetic array designs to flatten the field over the target surface brings very high target utilization to increase machine up-time and reduce material costs. Other benefit is much fewer defects when HiPIMS (High Power Impulse Magnetron Sputtering) is used.
Our magnetron sputtering cathodes can be powered using DC, MF, or HiPIMS power supplies. DC power provides a constant voltage, ideal for sputtering conductive materials. MF power alternates polarity, suitable for both conductive and insulating materials, reducing heat and improving film quality. HiPIMS uses high power pulses for dense plasma and superior film quality, but requires advanced, costly equipment.
Our magnetron sputtering cathodes can be powered using DC, MF, or HiPIMS power supplies. DC power provides a constant voltage, ideal for sputtering conductive materials. MF power alternates polarity, suitable for both conductive and insulating materials, reducing heat and improving film quality. HiPIMS uses high power pulses for dense plasma and superior film quality, but requires advanced, costly equipment.
Our magnetron sputtering cathodes can be powered using DC, MF, or HiPIMS power supplies. DC power provides a constant voltage, ideal for sputtering conductive materials. MF power alternates polarity, suitable for both conductive and insulating materials, reducing heat and improving film quality. HiPIMS uses high power pulses for dense plasma and superior film quality, but requires advanced, costly equipment.
Our magnetron sputtering cathodes can be powered using DC, MF, or HiPIMS power supplies. DC power provides a constant voltage, ideal for sputtering conductive materials. MF power alternates polarity, suitable for both conductive and insulating materials, reducing heat and improving film quality. HiPIMS uses high power pulses for dense plasma and superior film quality, but requires advanced, costly equipment.

Cutting tool hard PVD coatings

The cutting characteristics can be improved by using Physical Vapour Deposition (PVD) coatings.To satisfy customers demand for achieving highly efficient machining, STATON developed coatings together with geometry design to enhance wear resistance.

Advanced PVD coating machines

Discover the newest generation of OCTOARC and OCTOMAG series PVD coating equipment